ASI has designed a number of systems that are used to detect the presence of residual Deep UV or I-line photoresist on silicon wafers. The fundamental process at the core of the system is to determine the excitation and emission wavelength of the fluorescence that the particular photoresist may have, and to then custom design a system to detect this photoresist, even at very low levels. ASI employs proprietary technology to deliver a system that will increase production, and prevent costly downtime due to contamination.
We use is a three-part process that allows us to develop a custom system for the user based upon their actual requirements. The basic system consists of a custom excitation source, a sensitive photomultiplier (PMT) detector, and all of the necessary optical elements to integrate the system into your existing inspection line. Complete systems can also be developed to user specifications to provide complete motion control and automated wafer handling.
Phase I
Non-disclosure agreements are signed, then ASI engineers discuss the particular user requirements and submit a proposal based upon the user's needs.
Phase II
The user supplies test wafers and null wafers so that experiments / tests can be run at ASI's facility. There are numerous varieties of photoresist and other process materials that may be on a wafer, therefore it is important to determine the optimum excitation and emission wavelengths based upon the customers particular process requirements. A report is delivered to the user outlining the results of these tests, along with recommendations on the correct inspection system to utilize.
Phase III
Based upon the Phase II tests and the user requirements, ASI will develop and deliver a custom system to fit the users exact requirements.
If you are interested in residual photoresist detection systems, please contact us at , or call (800) 706-2284. If outside the US or Canada, please call (541) 461-8181.
